JPH0537476Y2 - - Google Patents

Info

Publication number
JPH0537476Y2
JPH0537476Y2 JP1990124134U JP12413490U JPH0537476Y2 JP H0537476 Y2 JPH0537476 Y2 JP H0537476Y2 JP 1990124134 U JP1990124134 U JP 1990124134U JP 12413490 U JP12413490 U JP 12413490U JP H0537476 Y2 JPH0537476 Y2 JP H0537476Y2
Authority
JP
Japan
Prior art keywords
image
optical
wafer
pixel
optical axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1990124134U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0373451U (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPH0373451U publication Critical patent/JPH0373451U/ja
Application granted granted Critical
Publication of JPH0537476Y2 publication Critical patent/JPH0537476Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1990124134U 1984-02-22 1990-11-26 Expired - Lifetime JPH0537476Y2 (en])

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58259084A 1984-02-22 1984-02-22

Publications (2)

Publication Number Publication Date
JPH0373451U JPH0373451U (en]) 1991-07-24
JPH0537476Y2 true JPH0537476Y2 (en]) 1993-09-22

Family

ID=24329741

Family Applications (2)

Application Number Title Priority Date Filing Date
JP60032947A Pending JPS60194537A (ja) 1984-02-22 1985-02-22 整列装置
JP1990124134U Expired - Lifetime JPH0537476Y2 (en]) 1984-02-22 1990-11-26

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP60032947A Pending JPS60194537A (ja) 1984-02-22 1985-02-22 整列装置

Country Status (1)

Country Link
JP (2) JPS60194537A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015226043A (ja) * 2014-05-30 2015-12-14 株式会社ディスコ ウェーハｉｄ読み取り装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6262538A (ja) * 1985-09-13 1987-03-19 Toshiba Corp 位置決め装置
JPH0625011Y2 (ja) * 1988-02-15 1994-06-29 株式会社東京精密 半導体チップの基準線検出装置
JP5560148B2 (ja) * 2010-09-14 2014-07-23 株式会社日立ハイテクノロジーズ 検査装置、及び位置決め装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54159876A (en) * 1978-06-07 1979-12-18 Nec Corp Wafer position detection method and its unit
JPS56134741A (en) * 1980-03-25 1981-10-21 Toshiba Corp Position detecting device
JPS574134A (en) * 1980-06-10 1982-01-09 Fujitsu Ltd Recognizing device
JPS57133428A (en) * 1981-02-12 1982-08-18 Nippon Kogaku Kk <Nikon> Alignment optical system capable of variable magnification
JPS57167651A (en) * 1981-04-07 1982-10-15 Mitsubishi Electric Corp Inspecting device for surface of semiconductor wafer
JPS57169251A (en) * 1981-04-09 1982-10-18 Toshiba Corp Recognizing device for position
JPS57198641A (en) * 1981-05-30 1982-12-06 Toshiba Corp Pattern detection
JPS5919344A (ja) * 1982-07-23 1984-01-31 Hitachi Ltd ２視野光学装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015226043A (ja) * 2014-05-30 2015-12-14 株式会社ディスコ ウェーハｉｄ読み取り装置

Also Published As

Publication number Publication date
JPS60194537A (ja) 1985-10-03
JPH0373451U (en]) 1991-07-24

Similar Documents

Publication Publication Date Title
US4845373A (en) Automatic alignment apparatus having low and high resolution optics for coarse and fine adjusting
JP2622573B2 (ja) マーク検知装置及び方法
KR100291607B1 (ko) 편평한인장형섀도우마스크칼라음극선관구성에사용하기위한광학검색시스템
US6504948B1 (en) Apparatus and method for automatically detecting defects on silicon dies on silicon wafers
US6175646B1 (en) Apparatus for detecting defective integrated circuit dies in wafer form
US4769523A (en) Laser processing apparatus
US4833621A (en) Method of and apparatus for aligning a substrate
KR100808718B1 (ko) 목적물의 결함을 검사하기 위한 장치 및 방법
US6487307B1 (en) System and method of optically inspecting structures on an object
US7006225B2 (en) Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method
JP3399697B2 (ja) 測定点マッピング装置およびこれを利用した半導体ウエハの測定装置
US20020042153A1 (en) Method for determining the internal orientation of a wafer
US4655600A (en) Alignment method
JPH0537476Y2 (en])
JPH07297241A (ja) プローブ方法
US5949900A (en) Fine pattern inspection device capable of carrying out inspection without pattern recognition
JP3823477B2 (ja) 画像計測装置
JPH11307567A (ja) バンプ検査工程を有する半導体装置の製造方法
JPH10216976A (ja) レーザ加工装置およびアライメント装置
JP2001330779A (ja) 走査式顕微鏡の焦点補正方法及び走査式顕微鏡
JP3816627B2 (ja) パターン検査装置
US20080151246A1 (en) Alignment routine for optically based tools
JP3897203B2 (ja) ボールグリッドアレイのボール高さ計測方法
JP2003152037A (ja) ウェハ検査方法、検査装置及び検査用赤外線撮像装置
JP3273049B2 (ja) ウエハのアライメント方法